PT Journal
AU Kejzlar, P
   Bakalova, T
   Petkov, N
   Bahchedzhiev, H
TI The Influence of CH4/N2 Gas Ratio on the Structure and Chemical Composition of Cr(C, N) Coatings Deposited by CAD Technology
SO Manufacturing Technology Journal
PY 2018
BP 917
EP 922
VL 18
IS 6
DI 10.21062/ujep/201.2018/a/1213-2489/MT/18/6/917
DE CAD technology; Cr(C; N) coatings; Surface morphology; Roughness
AB This article presents the study of the influence of the bias voltage and CH4/N2 gas ratio on the structure and chemical composition of Cr(C,N) coatings. The coatings were deposited by cathodic arc evaporation of pure Cr (99.99 %) cathode under an atmosphere of a mixture of CH4 and N2 gasses at the low deposition temperature of 300 ˚C. The ratio of reactive gasses was changed from 0 to 100 %. Energy-dispersive spectroscopy showed a linear dependence of resulting C/N ratio on the process gas ratio. The roughness of layers prepared from a mixture of process gasses is higher compared to pure gasses.
ER